Job seekers in the chemical engineering arena, along with representatives from many of the companies and industries that employ them, will discuss job opportunities and make employment connections when The American Institute of Chemical Engineers (AIChE) presents the latest installment in its Virtual Career Fair series, to be held on Wednesday, November 5, from 12:00 p.m. – 4:00 p.m. EST.
Chemical engineers at all career stages are invited to register for the event, where they will interact with employers from a cross section of the global chemical process industries. The Virtual Career Fair also offers a special time slot for undergraduate chemical engineers, from 3:00 p.m. – 4:00 p.m. EST.
The Virtual Career Fair offers most of the familiar elements of an in-person employment fair, but eliminates the restrictions imposed by geography and travel expenses. Job seekers, regardless of their current employment status or locations, can create a profile, submit their resumé, read job postings, and sign up for a live chat with recruiters. Employers can register for a virtual exhibit booth, post jobs, review candidate profiles, and chat with job seekers in real time.
Engineers who wish to register for and participate in the November 5 Virtual Career Fair will find instructions at http://www.aiche.org/resources/careers.
Employers can post their jobs and set up their virtual career fair booths by registering at http://www.aiche.org/resources/careers/career-fairs-employers.
About AIChE:
AIChE is a professional society of nearly 45,000 chemical engineers in 100 countries. Its members work in corporations, universities and government using their knowledge of chemical processes to develop safe and useful products for the benefit of society. Through its varied programs, AIChE continues to be a focal point for information exchange on the frontier of chemical engineering research in such areas as energy, sustainability, biological and environmental engineering, nanotechnology, and chemical plant safety and security. www.aiche.org.