(45b) CFD Modeling in Waste Gas Treatment Processes of Hi-Tech Manufacturing Plants
AIChE Spring Meeting and Global Congress on Process Safety
2024
2024 Spring Meeting and 20th Global Congress on Process Safety
Process Development Division
Advances in Process Design and Development II
Monday, March 25, 2024 - 4:00pm to 4:30pm
High-purity inorganic and organic compounds are used either as a reactant or cleaning gas in High-Tech manufacturing plants like semiconductor FABs and electronic display production line, due to which, exhaust waste gas containing both organic and inorganic compounds along with particulate dust are produced which are either toxic or flammable or harmful to environment. Different methods are employed for treating these waste gases depending on the type of pollutants and their required environmental standards for emission. Thermal oxidizers and thermal decomposers are normally used for VOC (volatile organic compounds) and toxic gaseous pollutants, while wet scrubber are normally used in the case of removing acidic or basic gas and particulate dust from the waste gas stream. This presentation will discuss CFD modeling of wet scrubbers and thermal oxidizers for waste gas treatment in high-tech manufacturing plants with a particular focus for design improvement and enhancement of process efficiencies of these equipment whose environmental importance is ever increasing in the midst of todayâs ESG (Environmental, Social, and Governance) spotlight.