(45b) CFD Modeling in Waste Gas Treatment Processes of Hi-Tech Manufacturing Plants | AIChE

(45b) CFD Modeling in Waste Gas Treatment Processes of Hi-Tech Manufacturing Plants

Authors 

Han, M. - Presenter, Samsung Engineering Co. LTD
Kshetrimayum, K. S., Samsung Engineering Co. Ltd
Lee, Y., Yonsei University


High-purity inorganic and organic compounds are used either as a reactant or cleaning gas in High-Tech manufacturing plants like semiconductor FABs and electronic display production line, due to which, exhaust waste gas containing both organic and inorganic compounds along with particulate dust are produced which are either toxic or flammable or harmful to environment. Different methods are employed for treating these waste gases depending on the type of pollutants and their required environmental standards for emission. Thermal oxidizers and thermal decomposers are normally used for VOC (volatile organic compounds) and toxic gaseous pollutants, while wet scrubber are normally used in the case of removing acidic or basic gas and particulate dust from the waste gas stream. This presentation will discuss CFD modeling of wet scrubbers and thermal oxidizers for waste gas treatment in high-tech manufacturing plants with a particular focus for design improvement and enhancement of process efficiencies of these equipment whose environmental importance is ever increasing in the midst of today’s ESG (Environmental, Social, and Governance) spotlight.