Jeff Elam is a Senior Chemist and Group Leader at Argonne National Laboratory where he directs a program in atomic layer deposition (ALD) technology with the goal of developing new applications for ALD in fields such as photovoltaics, catalysis, batteries, lithography, and large-area detectors. Jeff earned his B.A. in Chemistry from Cornell University and his Ph.D. in Physical Chemistry from the University of Chicago. As a Postdoctoral Researcher at the University of Colorado, Jeff developed ALD thin film growth methods. Dr. Elam has authored over 200 papers and is an inventor on over 50 patents and inventions related to ALD. Jeff won the ALD Innovation Award in 2017, and has recieved four R&D100 Awards. He is heavily involved in chairing and organizing ALD sessions at ECS and AVS.