Rahul serves as Advanced Control & Optimization (AC&O) Technology Leader and Manager at Dow. He has received twelve Dow technology center awards for technology innovations that have a 10-year net present value of approximately $384 million. Rahul was elected as a Fellow of the American Institute of Chemical Engineers (AIChE) in July 2023. He is the recipient of the 2017 AIChE Computing Practice Award for his outstanding contributions in the application of Chemical Engineering to computing and systems technology. He is an industry leader with 28 refereed journal papers and 24 external presentations in addition to a patent on nonlinear control.
Rahul has provided service to process systems engineering community especially by volunteering as conference chair for Foundations of Computer-Aided Process Operations and Chemical Process Control (FOCAPO-CPC) 2023, AIChE CAST Division Director (2020-2022) and AIChE RAPID Process Intensification Institute focal point for Process Modeling and Simulation area (2018-2022) in addition to other activities. He has served as Aspentech’s Advanced Control & Optimization industrial users group chairperson and board member from 2009-2013; chaired several AIChE CAST division sessions and served on the programming committee of FOCAPO/CPC 2017. He received a Ph.D. (Ch.E.) from University of Wisconsin-Madison, M.S. (Ch.E.) from Texas A&M University and a B.S. (Ch.E.) from Indian Institute of Technology, Kanpur.
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