(508c) Pore Expansion in Cationic Fluorinated Surfactant Templated Porous Silica Thin Films through Supercritical Carbon Dioxide Processing | AIChE

(508c) Pore Expansion in Cationic Fluorinated Surfactant Templated Porous Silica Thin Films through Supercritical Carbon Dioxide Processing

Authors 

Rankin, S. E., University of Kentucky
Knutson, B. L., University of Kentucky


The effect of processing mesoporous silica thin films with supercritical CO2 immediately after casting is investigated, with a goal of using the penetration of CO2 molecules in the tails of CO2-philic cationic fluorinated surfactant templates to tailor the final pore size. Well-ordered thin films with 2D hexagonal close-packed pore structure are synthesized through the liquid phase co-assembly of a homologous series of perfluoroalkylpyridinium chloride surfactants and an inorganic silica precursor. Hexagonal mesopore structures are obtained for both unprocessed films and CO2-processed films (69 ? 172 bar and 25oC - 45oC for 72 hours). XRD and TEM analysis reveal controlled and significant increases in pore size for all CO2 treated thin films relative to the unprocessed sample with increase of CO2 pressure.

The degree of pore expansion achieved is hypothesized to be due to solvation of the fluorinated tail by CO2 molecules and is observed to be directly dependent on the length of the fluorinated tail of the surfactants. Measurements of interfacial tension at the water-CO2 interface in the presence of the cationic fluorinated surfactants is used to interpret the degree of tail solvation with the length of the fluorinated tail. Pore expansion achieved in this study demonstrate the ability to control the pore size in ordered mesoporous silica thin films by combining the tunable solvent strength of compressed and supercritical CO2 and the design of ?CO2-philic' fluorinated surfactants.