Advances in Nanolithography

This session features papers concerning the advancement in lithography process for information and biological applications at the nanometer scale. The areas include photo/electron/ion-beam lithography and other emerging techniques like soft lithography, imprint lithography, directed self-assembly, shadow lithography, and scanning probe. Exemplary topics include (but not limit to) fundamental chemical processes in nanolithography, photoresist formulation, photopolymerization, photo/electron optics optimization, multilayer alignment technique, and new routes for high-throughput scalability.