(426j) Fabricating Highly Active Mixed Phase Tio2 Photocatalysts by Low Angle Reactive DC Magnetron Sputtering

Recent work points to the importance of the solid-solid interface in explaining the high photoactivity of mixed phase TiO₂ catalysts. The goal of the project is to probe the structural and functional relationships of the solid-solid interface created by reactive DC magnetron sputtering of titanium dioxide. We show that sputter deposition provides excellent control of the phase and interface formation. We explored the effects of the process parameters of pressure, oxygen partial pressure, target power, substrate bias (RF), deposition incidence angle, and post annealing treatment on the structural and functional characteristics of the catalysts. We have successfully made pure and mixed phase TiO₂ films. These films were characterized with AFM, SEM, TEM, and XRD to determine surface morphology, phase distribution and phase content. The performance as photocatalytic surfaces was measured and compared (normalized for surface area) to mixed phase TiO₂ fabricated by other methods, including flame hydrolysis powders, and sol-gel deposited TiO₂ films. The sputtered mixed phase materials were far superior to the commercial standard (Degussa P25) and sol-gel TiO₂ as measured by the gas phase degradation of the air pollutant acetaldehyde under UV illumination. These results demonstrate that reactive DC magnetron sputtering is a powerful tool for investigating the role of the solid-solid interface in influencing photocatalystic activity. In addition, our work illustrates the feasibility of reactive DC magnetron sputtering as a practical commercial technique for manufacturing highly active nanostructured TiO₂ photocatalysts.