(326b) Recovery Of High Purity Organic Solvents From Waste Photoresist Strippers

Photoresist strippers used to remove the residue of photoresist in the TFT-LCD or semiconductor process are organic solvent mixtures with some additives. In the present experiments, main organic solvents including NMP and BDG were reclaimed from waste photoresist stripper by using a spinning band distillation column. Purity of final products were obtained to be 99.5%, water content less than 0.05% and most metal contents less than 10ppb, respectively. To extend those experiments further, a computer simulation for a continuous distillation process was made using NRTL and Peng-Robinson equations.