Removal of Silica and Alumina Nanoparticles from Chemical Mechanical Planarization (CMP) Effluents by Ultra and Nano-Filtration | AIChE

Removal of Silica and Alumina Nanoparticles from Chemical Mechanical Planarization (CMP) Effluents by Ultra and Nano-Filtration

Authors 

Matias-Velez, K. Z. - Presenter, University of Puerto Rico, Mayaguez Campus
Santana, A. - Presenter, University of Puerto Rico, Mayaguez Campus
Padilla-Luciano, Y. - Presenter, University of Puerto Rico, Mayaguez Campus
Bogere, M. N. - Presenter, University of Puerto Rico, Mayaguez Campus