Plasma-Assisted and Thermal Chemical Vapor Deposition
AIChE Annual Meeting
2008
2008 Annual Meeting
Materials Engineering and Sciences Division
Oral
Room 202-B
Pennsylvania Convention Center
Tuesday, November 18, 2008 - 3:15pm to 5:45pm
Chair(s)
Han, S. M., University of New Mexico
Co-chair(s)
Ekerdt, J., University of Texas-Austin
Deposition of thin films using thermal decomposition of metal-organic and organometallic precursors. Characterization of films deposited from CVD.
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