Plasma Processing and Emerging Applications | AIChE

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Plasma Processing and Emerging Applications

Chair(s)

Agarwal, S., Colorado School of Mines

Plasma Processing

Presentations

12:30 PM
(310a) Compositional Tuning of Bimetallic Nanoparticles for Low Temperature Carbon Nanotube Growth
12:48 PM
(310b) Design of a High Throughput Microwave Plasma Reactor for Bulk Production of Metal Oxide Nanowires
1:06 PM
(310c) Modeling Plasma-Surface Interactions and Their Role In Inducing Structural Transitions In Materials
1:24 PM
(310d) 3-Dimensional Monte Carlo Profile Simulation and Experimental Measurements of Surface Roughness Under Plasma Etching
1:42 PM
(310e) Simulation of Profile Evolution In Shallow Trench Formation by Plasma Etching
2:00 PM
(310f) Molecular Dynamics Simulations of Plasma-Surface Interactions: Nanoscale Feature Etching on a Silicon Substrate
2:18 PM
(310g) Stochastic Differential Charging and Its Effects on Charging Damage and Feature Profile Evolution during Plasma Processing
2:36 PM
(310h) Coupling Gas Phase and Surface Reaction Kinetics In C4F8 and SF6 Plasmas Used for Si and SiO2 Etching

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Pricing

Individuals

AIChE Pro Members $150.00
AIChE Graduate Student Members Free
AIChE Undergraduate Student Members Free
AIChE Explorer Members $225.00
Non-Members $225.00

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