(658a) A Highly Ordered Nanostructured Surface for Ultra-Sensitive SERS and the Detection of Rhodamine-G and DNA at Trace Levels
AIChE Annual Meeting
2010
2010 Annual Meeting
Materials Engineering and Sciences Division
Nanostructured Materials for Electronic and Photonic Applications
Thursday, November 11, 2010 - 12:30pm to 12:55pm
A SERS active substrate is fabricated based on well-ordered silicon nanostructure, using standard Si nanofabrication process technologies. This substrate has ordered silicon nanostructures with sharp edges and sub-100nm gaps followed by silver (30nm) and gold (15nm) deposition. These SERS substrates were measured using a InVia Raman microscope. Considerably enhanced Raman scattering was observed for a variety of test compounds. In particular, Rhodamine 6G and DNA were detected down to the 10-12M level.
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