(658a) A Highly Ordered Nanostructured Surface for Ultra-Sensitive SERS and the Detection of Rhodamine-G and DNA at Trace Levels | AIChE

(658a) A Highly Ordered Nanostructured Surface for Ultra-Sensitive SERS and the Detection of Rhodamine-G and DNA at Trace Levels

Authors 

Garland, M. - Presenter, Institute of Chemical and Engineering Sciences
Widjaja, E. - Presenter, Institute of Chemical and Engineering Sciences
Nizamudin, M. K. - Presenter, Institute of Chemical and Engineering Sciences
Salim, S. M. - Presenter, Institute of Chemical and Engineering Sciences
Agarwal, A. - Presenter, Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research),
Buddharaju, K. - Presenter, Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research),


A SERS active substrate is fabricated based on well-ordered silicon nanostructure, using standard Si nanofabrication process technologies. This substrate has ordered silicon nanostructures with sharp edges and sub-100nm gaps followed by silver (30nm) and gold (15nm) deposition. These SERS substrates were measured using a InVia Raman microscope. Considerably enhanced Raman scattering was observed for a variety of test compounds. In particular, Rhodamine 6G and DNA were detected down to the 10-12M level.

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[2] A. Agarwal, C. Fang, KD Buddharaju, N. Balasubramanian1, D.L. Kwong, N. Md. Khalid, S. M. Salim, E. Widjaja and M. Garland, Transducers'07 and Eurosensors XXI (2007), U970-U971

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