(618bq) Atomic Layer Deposition of Bimetallic Nickel/Nickel Oxide and Platinum Catalysts on Alumina for Electrochemical Devices | AIChE

(618bq) Atomic Layer Deposition of Bimetallic Nickel/Nickel Oxide and Platinum Catalysts on Alumina for Electrochemical Devices

Authors 

Gould, T. D. - Presenter, University of Colorado at Boulder
Weimer, A. W. - Presenter, University of Colorado at Boulder


Platinum-nickel bimetallic, often
in the form of nanoparticles, is one of the most effective catalysts for both
the hydrogen oxidation reaction (HOR) and oxygen reduction reaction (ORR) in
hydrogen fuel cells. Issues arise with use of nanoparticles due to their
aggregation at higher temperatures, such as when used in phosphoric acid fuel
cells. With larger particles, expensive bulk atoms go unutilized which
increases the cost of the device and decreases its lifetime.  Atomic layer deposition (ALD) is a scalable deposition
method that can create materials with tunable sizes.  Using either oxygen or hydrogen as a
precursor, nickel particles and nickel oxide films were grown on alumina using
ALD.  Then platinum was deposited using
ALD on both materials using either the oxygen and hydrogen chemistry.  These catalysts were investigated for HOR
activity and were inspected using Transmission
Electron Microscopy (TEM), and Inductively Coupled Plasmon Mass Spectroscopy
(ICP-MS).

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