(217bj) Fabrication and Thin Film Characterization of Sulfonated Poly(Styrene-Isobutylene-Styrene) Triblock Copolymers for Microelectronic Applications

Fabrication and Thin Film Characterization of Sulfonated Poly(Styrene-Isobutylene-Styrene) Triblock Copolymers for Microelectronic Applications

Omar Movil^a and Agnes M. Padovani^a,b

^a Department of Chemical Engineering and ^b Department of Engineering Science and Materials, University of Puerto Rico-Mayaguez

Abstract

Sulfonated block copolymers have traditionally being targeted as proton exchange membranes for fuel cell applications, but more recent advances have highlighted their potential application into other microelectrochemical devices such as sensors, biosensors, and actuators. This study focuses on the fabrication and characterization of sulfonated poly(styrene-isobutylene-styrene) (SIBS) triblock copolymer thin films. For these studies, SIBS thin films are deposited via spin-coating onto silicon wafer substrates and the effects of critical process variables such as sulfonation percent and polymer concentration are evaluated on the mechanical, chemical, and morphological properties of the films. A comprehensive materials characterization scheme aims at understanding how differences in mechanical properties can be correlated with variations in the morphology of the films. Some of the materials characterization techniques used in this study include, but are not limited to: atomic force microscopy (AFM), nanoindentation, Fourier transform infrared spectroscopy (FTIR), and optical microscopy. In addition, to further assess the integration capability of the newly-developed SIBS thin films, adhesion studies were conducted on a variety of substrates and electrode materials. These were conducted using a scratch technique in a nanoindentation system. The presentation will summarize the results of the SIBS materials characterization studies as well as the compatibility studies with traditional microfabrication techniques such as photolithography and etching.