(115c) Applications of Atomic Layer Deposition in Nanoelectronic Systems

Atomic layer deposition (ALD) is a promising deposition technique for nanoelectronic applications. Reasons for this include low temperature processing, self-limiting growth, and sub-nanometer thickness precision. ALD can be used as a complementary technique to coat preexisting nanostructures, or as a technique to directly fabricate nanostructures via inherent nucleating properties of materials. Here, applications of ALD in several nanoelectronic systems are presented. These include graphene and carbon nanotube transistors, kesterite-based solar cells, and nonvolatile memory devices. Attention will also be given to the engineering of ALD thin film stoichiometry and oxidation coordination through chemical precursor selection.