(153b) The Stability of ALD Thin-Film Coated Electrode Surface in Electrolyte Solutions

Atomic Layer Deposition (ALD) thin films like Al₂O₃ and ZnO are extensively used in device fabrication. Assessing their stability in electrolyte solutions is vital to comprehend their performance and longevity in applications such as sensors, batteries, and fuel cells. Understanding film properties ensures device efficiency and durability in various electrochemical applications. While bulk metal oxides are stable in neutral pH electrolytes, this may not hold true for ultra-thin ALD films. In this study, we deposit ALD films of 1-10 nm thickness on electrodes and systematically examine their stability in representative electrolyte solutions. Electrochemical analyses will be supported by advanced characterization methods such as FTIR and AFM. This research will provide valuable insights into ALD thin film device stability in potential sensing and biosensing applications.