(24a) Chemical Processing of Function Accelerated Nano-Materials at the Atomic Scale

This talk presents current advances in atomic scale processing of function accelerated nano-materials and the key challenges and opportunities in the future that can enable novel integrated circuits for commercial and defense applications. Amongst all enablers, plasma processing science, due to its intrinsic nonequilibrium nature, has been at the heart of many key technologies and provided breakthrough solutions in the information processing system hierarchy, translating physics to a physically functioning embodiment with enhanced device performance. To realize the full potential of these materials, plasma surface science becomes increasing more important in material synthesis, material processing and device embodiment, all requiring atomic level control and precision. In this talk, plasma enhanced atomic layer deposition of multiferroic materials and atomic layer etching of magnetic materials will be showcased as examples that leverage the fundamental knowledge base in plasma physics and chemistry to address future technological grand challenges.