(22c) Chronic Pain Resulting From Your Relief Device Management Systems
AIChE Spring Meeting and Global Congress on Process Safety
2010
2010 Spring Meeting & 6th Global Congress on Process Safety
Global Congress on Process Safety
LOPA Bloopers and Outtakes
Monday, March 22, 2010 - 11:00am to 11:30am
With the increasing use of Layer of Protection Analysis as a semi-quantitative method of assessing process risk, LOPA practitioners are asked to assign credit to numerous safeguards including relief devices. Relief devices are only as strong as the initial design of the component and the systems that manage subsequent operation and maintenance of the devices. If the management systems for Process Safety Information, Management of Change, PSSR, Incident Investigation, Operating Procedures, Mechanical Integrity, and Training, are not robust enough to ensure diligent management of relief devices, then credit may be applied liberally during a LOPA study resulting in a residual risk lower than the actual risk. This paper analyzes the effects that various PSM management systems have on relief devices, incorporates examples from LOPA studies that reinforce how relief device credits can be liberally applied, and suggests questions that LOPA practitioners can ask about management systems to apply appropriate credits.
Checkout
This paper has an Extended Abstract file available; you must purchase the conference proceedings to access it.
Do you already own this?
Log In for instructions on accessing this content.
Pricing
Individuals
AIChE Pro Members | $150.00 |
AIChE Graduate Student Members | Free |
AIChE Undergraduate Student Members | Free |
AIChE Explorer Members | $225.00 |
Non-Members | $225.00 |