(89a) A Novel Thin Film Deposition Method of Doped TiO2 Particles for Environmental Applications (Invited)

Nanoparticles are increasingly used for many applications targeting environment problems. The key challenge is its handling and performance. The latter is affected due to secondary processes such as aggregation and the former arise in transportation and safe disposal. This is solved by depositing the nano particle on a substrate, which are commonly termed as thin films. However the performance of thin films is limited to various physical factors, such as film thickness, configuration, material property etc which is often linked to the deposition method itself.

In this paper we present a novel deposition method named as chemical beam vapor deposition which allows the precise control of film growth rate and film configuration. The deposited film is charactirized and tested for its environmental application.