Atomic Layer Deposition
AIChE Annual Meeting
2005
2005 Annual Meeting
Materials Engineering and Sciences Division
Oral
Cincinnati Convention Center
Friday, November 4, 2005 - 8:00am to 10:30am
Chair(s)
Musgrave, C. B., Stanford University
Co-chair(s)
Rogers, B. R., Vanderbilt University
Atomic Layer Deposition is a film growth technology that is capable of depositing uniform and conformal films with atomic precision. It is rapidly growing field with applications in many fields related to chemical engineering. This session will include talks from both electronic materials processing as well as other areas of application. Topics including kinetic analyses, modeling, surface adsorption studies, process integration, and equipment development issues are strongly encouraged.
Presentations
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Pricing
Individuals
| AIChE Pro Members | $150.00 |
| AIChE Graduate Student Members | Free |
| AIChE Undergraduate Student Members | Free |
| AIChE Explorer Members | $225.00 |
| Non-Members | $225.00 |