2025 Spring Meeting and 21st Global Congress on Process Safety April 6-10, 2025 Hilton Anatole, Dallas, TX
2025 AIChE Annual Meeting November 2-6, 2025 John B. Hynes Veterans Memorial Convention Center, Marriott Copley Place, Sheraton Back Bay | Boston, MA
Archived Webinar Want to be an Entrepreneur? Personal Stories From Three Successful Entrepreneurs Who Have Traveled This Path.
(258a) In Situ Measurement Of The Ion Incidence Angle Dependence Of The Ion-Enhanced Etching Yield In Plasma Reactors Conference AIChE Annual Meeting Year 2007 Proceeding 2007 Annual Meeting Group Materials Engineering and Sciences Division Session Plasma Processing Time Tuesday, November 6, 2007 - 12:30pm to 12:50pm Authors Belen, R. J. - Presenter, Applied Materials Aydil, E. S. - Presenter, University of Minnesota Gomez, S. - Presenter, Intel Kiehlbauch, M. - Presenter, Micron
Conference AIChE Annual Meeting Year 2007 Proceeding 2007 Annual Meeting Group Materials Engineering and Sciences Division Session Plasma Processing Time Tuesday, November 6, 2007 - 12:30pm to 12:50pm
