Gas-Phase Deposition of Thin Films | AIChE

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Gas-Phase Deposition of Thin Films

Chair(s)

Ekerdt, J., University of Texas-Austin

Co-chair(s)

Ashurst, W. R., Auburn University

This session calls for papers related to gas-phase deposition of thin films, including but not limited to physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, and atomic layer deposition.

Presentations

12:30 PM
(92a) GaAs Integration On High-Quality Ge On Si for Multijunction Solar Cells
12:55 PM
(92b) Integration of iCVD Polymer Electrolytes in Quasi Solid State Dye Sensitized Solar Cells
1:20 PM
(92c) Chemical Vapor Deposition of WNxCy for Diffusion Barrier Application Using a Tungsten Diphenylhydrazido Complex
1:45 PM
(92d) Predicting and Controlling Self-Assembly in Al(110) Homoepitaxial Growth
2:10 PM
(92e) Chemical Vapor Deposition Reactor Design for Copper Oxide Films Used in Photoelectrochemical Hydrogen Production Applications
2:35 PM
(92f) Dispersed Nanoelectrodes Devices

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Pricing

Individuals

AIChE Pro Members $150.00
AIChE Graduate Student Members Free
AIChE Undergraduate Student Members Free
AIChE Explorer Members $225.00
Non-Members $225.00

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