2025 Spring Meeting and 21st Global Congress on Process Safety April 6-10, 2025 Hilton Anatole, Dallas, TX
2025 AIChE Annual Meeting November 2-6, 2025 John B. Hynes Veterans Memorial Convention Center, Marriott Copley Place, Sheraton Back Bay | Boston, MA
Archived Webinar Want to be an Entrepreneur? Personal Stories From Three Successful Entrepreneurs Who Have Traveled This Path.
Richard A. Lawson Citation name Lawson, R. A. Affiliation Georgia Institute of Technology State GA Country USA Authored(384f) Fundamental Diffusion Behavior of Polymer Ultrathin Films: Effect of Film Thickness, Molecular Weight, and AgingRichard A. LawsonClifford L. HendersonIvan Ordaz2006 Annual Meeting (633f) Diffusion And Relaxation Behavior Of Polymer Ultra-Thin Films: A Progress ReportRichard A. Lawson2007 Annual Meeting (5bm) Single Molecule Chemically Amplified Photoresists for NanolithographyRichard A. LawsonClifford L. Henderson2008 Annual Meeting (26a) Diffusion, Mass Uptake, and Free Volume Behavior of Polymer Thin and Ultra-Thin FilmsClifford L. HendersonRichard A. Lawson2008 Annual Meeting (5bc) Rational Design of Advanced Materials: Combining Modeling, Synthesis, Processing, and Characterization to Generate Superior MaterialsRichard A. LawsonClifford L. Henderson2009 Annual Meeting (628e) In-Situ Control of Cationic Polymerization Kinetics for Negative Tone PhotoresistsRichard A. LawsonClifford L. Henderson2009 Annual Meeting (573e) Mesoscale Kinetic Monte Carlo Simulations of Molecular Glass PhotoresistsRichard A. LawsonClifford L. Henderson2009 Annual Meeting (651d) Diffusion and Mass Uptake Behavior of Polymer Thin and Ultra-Thin FilmsRichard A. LawsonAnnapoorani SundaramoorthiClifford L. Henderson2009 Annual Meeting (581b) Mechanical Properties of Polymer Thin Films and NanostructuresRichard A. LawsonDavid E. NogaClifford L. Henderson2009 Annual Meeting (207g) Modifying Properties of Polymer Nanostructure through Liquid Phase Reactive TreatmentsRichard A. LawsonDavid E. NogaClifford L. Henderson2009 Annual Meeting (4bu) Rational Design of Advanced Organic MaterialsRichard A. LawsonClifford L. Henderson2010 Annual Meeting (241f) Structure-Property Relations for the Design of Organic Glasses for Organic Electronics and NanolithographyRichard A. LawsonClifford L. Henderson2010 Annual Meeting (614c) Negative Tone Photoresists Based On Cationic Polymerization for High Resolution LithographyRichard A. LawsonClifford L. Henderson2010 Annual Meeting (664f) Reactive Rinse Treatment to Enhance the Mechanical Properties of Photoresist Thin FilmWei-Ming YehDavid E. NogaRichard A. LawsonLaren M. TolbertClifford L. Henderson2010 Annual Meeting (349b) Understanding the Relationship Between True and Measured Nanoscale Feature Size and Roughness Using a Detailed SEM SimulatorRichard A. LawsonClifford L. Henderson2010 Annual Meeting Associated proceedings 2006 Annual Meeting 2007 Annual Meeting 2008 Annual Meeting 2009 Annual Meeting 2010 Annual Meeting
